“Atomic Layer Deposition, International Journal” (ISSN 2772-2570) is a diamond open access journal. This means that it is free to publish and free to read. You can submit high quality scientific articles about atomic layer deposition or related fields. Submitted articles will be read by our Editors, and after their approval, will be subject to a peer review process. They will be published on our website, and shared with the relevant databases. See the Journal pages for more details.
ALDiJ focuses on original, cutting-edge, interdisciplinary contents in the field of digital coating and etching technologies, in particular atomic layer deposition, molecular layer deposition, atomic layer etching, etc., which generate hypotheses and questions relevant to the science and technology and guide the investigations of nanolayer chemistry. The journal publishes new methods, important applications, and new interpretations and treatments of existing data, as well as conventional studies in chemistry that can be applied to future coating applications.
ALDiJ subscribes fully to the COPE code of conduct and best practice for journal editors ensuring that our editors are accountable for everything published in our journal. Our readers will always be informed about how the research is funded and our relationships with authors, reviewers and editorial board members will be influenced by COPE recommendations.
Founded & published By
ALDiJ was established by Dr. D.J. Monsma and Ultimaterials BV Netherlands. The journal publishes as an online open access journal.
